On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation-Reference-Cited by-同舟云学术

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On the role of ion potential energy in low energy HiPIMS deposition: An atomistic simulation

Published:2021-11 Issue: Volume:426 Page:127726
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kateb Movaffaq,Gudmundsson Jon Tomas,Brault Pascal,Manolescu Andrei,Ingvarsson Snorri

Funder

Háskóli Íslands

Icelandic Centre for Research

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference76 articles.

1. Ionized physical vapor deposition (IPVD): a review of technology and applications;Helmersson;Thin Solid Films,2006

2. The high power impulse magnetron sputtering discharge;Gudmundsson;J. Vac. Sci. Technol. A,2012

3. Physics and technology of magnetron sputtering discharges;Gudmundsson;Plasma Sources Sci. Technol.,2020

4. Ionization of sputtered material in a planar magnetron discharge;Christou;J. Vac. Sci. Technol. A,2000

5. Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge;Gudmundsson;Surf. Coat. Technol.,2002

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