Heavy metal gettering in silicon‐on‐insulator structures formed by oxygen implantation into silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.335910
Reference6 articles.
1. Carrier lifetimes in silicon epitaxial layers deposited on oxygen-implanted substrates
2. Increased carrier lifetimes in epitaxial silicon layers on buried silicon nitride produced by ion implantation
3. Metal Impurities near the SiO2 ‐ Si Interface
4. The Top Silicon Layer of SOI Formed by Oxygen Ion Implantation
5. Effects of implantation temperature on the properties of buried oxide layers in silicon formed by oxygen ion implantation
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2. Excess oxygen limited diffusion and precipitation of iron in amorphous silicon dioxide;Journal of Applied Physics;2017-10-07
3. Gettering in silicon-on-insulator wafers: experimental studies and modelling;Semiconductor Science and Technology;2005-04-15
4. Cu gettering to nanovoids in SOI materials;Science in China Series E;2003
5. Arsenic Redistribution during Rapid Thermal Chemical Vapor Deposition of TiSi[sub 2] on Si;Journal of The Electrochemical Society;2001
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