Excess oxygen limited diffusion and precipitation of iron in amorphous silicon dioxide-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Excess oxygen limited diffusion and precipitation of iron in amorphous silicon dioxide

Published:2017-10-07 Issue:13 Volume:122 Page:135302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Leveneur J.¹²^ORCID,Langlois M.¹,Kennedy J.¹²,Metson James B.²³

Affiliation:

1. National Isotope Centre GNS Science, P.O. Box 31312, Lower Hutt 5010, New Zealand

2. The MacDiarmid Institute for Advanced Materials and Nanotechnology, SCPS Victoria University, P.O. Box 600, Wellington 6140, New Zealand

3. Department of Chemistry, The University of Auckland, Private Bag 92019, Auckland, New Zealand

Funder

New Zealand Minsitry of Business Innovation and Employment (MBIE)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4985819

Reference34 articles.

1. Effect of introducing gettering sites and subsequent Au diffusion on the thermal conductivity and the free carrier concentration in n-type 4H-SiC

2. Gettering in silicon-on-insulator wafers: experimental studies and modelling

3. Heavy metal gettering in silicon‐on‐insulator structures formed by oxygen implantation into silicon

4. Gettering of Cu by microcavities in bonded/ion-cut silicon-on-insulator and separation by implantation of oxygen

5. Gettering of Au to dislocations and cavities in silicon

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impurity Gettering in Polycrystalline‐Silicon Based Passivating Contacts—The Role of Oxide Stoichiometry and Pinholes;Advanced Energy Materials;2022-05

2. On the annealing-induced enhancement of the interface properties of NiO:Cu/wet-SiOx/n-Si tunnelling junction solar cells;Applied Physics Letters;2018-04-23

3. Impact of Metals on Silicon Devices and Circuits;Metal Impurities in Silicon- and Germanium-Based Technologies;2018

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3