Suppression of the regrowth interface leakage current in AlGaN/GaN HEMTs by unactivated Mg doped GaN layer
Author:
Affiliation:
1. National Institute for Materials Science, Tsukuba 987-6543, Japan
2. Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya 464-8601, Japan
3. Department of Electronics, Nagoya University, Nagoya 464-8601, Japan
Funder
MEXT
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
https://aip.scitation.org/doi/pdf/10.1063/5.0034584
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