Hydrogen in low‐pressure chemical‐vapor‐deposited silicon (oxy)nitride films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.336651
Reference23 articles.
1. Characterization of low‐pressure chemical‐vapor‐deposited and thermally‐grown silicon nitride films
2. Hydrogen content and annealing of memory quality silicon-oxynitride films
3. Hydrogen‐Implanted Silicon Nitride
4. Chemically Bound Hydrogen in CVD Si3 N 4: Dependence on NH 3 / SiH4 Ratio and on Annealing
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