Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma-Reference-Cited by-同舟云学术

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Plasma diagnostics of low pressure high power impulse magnetron sputtering assisted by electron cyclotron wave resonance plasma

Published:2012-11 Issue:9 Volume:112 Page:093305
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Stranak Vitezslav,Herrendorf Ann-Pierra,Drache Steffen,Cada Martin,Hubicka Zdenek,Bogdanowicz Robert,Tichy Milan,Hippler Rainer

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4764102

Reference68 articles.

1. A novel pulsed magnetron sputter technique utilizing very high target power densities

2. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

3. High power impulse magnetron sputtering discharge

4. Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge

5. Ionized physical vapor deposition (IPVD): A review of technology and applications

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1. Deposition and characterisation of c-axis oriented AlScN thin films via microwave plasma-assisted reactive HiPIMS;Surface and Coatings Technology;2023-07

2. Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation;Surface and Coatings Technology;2023-02

3. Time-resolved electron energy distribution functions at the substrate during a HiPIMS discharge with cathode voltage reversal;Plasma Sources Science and Technology;2022-06-01

4. A comparative investigation of hetero-epitaxial TiC thin films deposited by magnetron sputtering using either hybrid DCMS/HiPIMS or reactive DCMS process;Applied Surface Science;2021-01

5. Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System;Coatings;2020-03-03

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