Ion beam deposition of fluorinated amorphous carbon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1404419
Reference52 articles.
1. Fluorinated amorphous carbon films for low permittivity interlevel dielectrics
2. Effect of sputtering with hydrogen dilution on fluorine concentration of low hydrogen content fluorinated amorphous carbon thin films with low dielectric constant
3. Deposition of highly crosslinked fluorinated amorphous carbon film and structural evolution during thermal annealing
4. Plasma deposition of low-dielectric-constant fluorinated amorphous carbon
5. Fluorine‐induced suppression of disorder effects of carbon in the hydrogenated amorphous silicon‐carbon alloy thin films
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2. Characterization of superhydrophobic a-C:F thin film deposited on porous silicon via laser ablation of a PTFE target;Diamond and Related Materials;2016-04
3. Increasing fluorine concentration to control the microstructure from fullerene-like to amorphous in carbon films;RSC Advances;2016
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