High-energy negative ion beam obtained from pulsed inductively coupled plasma for charge-free etching process
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3152763
Reference15 articles.
1. Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas
2. Digital etching study and fabrication of fine Si lines and dots
3. Pulsed Plasma Processing for Reduction of Profile Distortion Induced by Charge Buildup in Electron Cyclotron Resonance Plasma
4. Charging of pattern features during plasma etching
5. Reactive–fast‐atom beam etching of GaAs using Cl2gas
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