Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas-Reference-Cited by-同舟云学术

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Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas

Published:2000-07 Issue:4 Volume:18 Page:1220-1224
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Lee J. W.,Devre M. W.,Reelfs B. H.,Johnson D.,Sasserath J. N.,Clayton F.,Hays D.,Pearton S. J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.582329

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