Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.118988
Reference14 articles.
1. Near‐field direct‐write ultraviolet lithography and shear force microscopic studies of the lithographic process
2. Wavefront Engineering for Photolithography
3. Chromeless phase-shifted masks: a new approach to phase-shifting masks
4. Photolithographic Contact Printing of 4000Å Linewidth Patterns
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