Influence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering-Reference-Cited by-同舟云学术

Influence of duty cycle on the structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering

Published:2003-09 Issue:5 Volume:94 Page:3624-3628
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Cheng Y. H.,Kupfer H.,Richter F.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1599628

Reference24 articles.

1. Reactive alternating current magnetron sputtering of dielectric layers

2. Mid frequency sputtering with TwinMag®-a survey of recent results

3. Properties of Si₃N₄-Layers Deposited by Medium Frequency Twin Magnetron Sputtering

4. Electrical characteristics of thin Ta2O5 films deposited by reactive pulsed direct-current magnetron sputtering

5. Influence of process parameters on the structure and the properties of ZrO2 coatings deposited by reactive pulsed magnetron sputtering (PMS)

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