Structure and interface bonding of GeO2∕Ge∕In0.15Ga0.85As heterostructures
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2992560
Reference21 articles.
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4. Development of GaAs-based MOSFET using molecular beam epitaxy
5. Surface passivation of III-V compound semiconductors using atomic-layer-deposition-grown Al2O3
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2. Interfacial, Electrical, and Band Alignment Characteristics of HfO2/Ge Stacks with In Situ-Formed SiO2 Interlayer by Plasma-Enhanced Atomic Layer Deposition;Nanoscale Research Letters;2017-05-25
3. Ar Plasma Treatment for III–V Semiconductor-Based Transistor Source/Drain Contact Resistance Reduction;Journal of Nanoscience and Nanotechnology;2016-10-01
4. Improved thermal stability and electrical properties of atomic layer deposited HfO2/AlN high-k gate dielectric stacks on GaAs;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2015-01
5. The combination self-cleaning effect of trimethylaluminium and tetrakis (dimethyl-amino) hafnium pretreatments on GaAs;Applied Surface Science;2012-12
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