Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system-Reference-Cited by-同舟云学术

Multi-scale structure patterning by digital-mask projective lithography with an alterable projective scaling system

Published:2018-06 Issue:6 Volume:8 Page:065317
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Liu Yu-Huan¹²,Zhao Yuan-Yuan³,Dong Xian-Zi¹,Zheng Mei-Ling¹,Jin Feng¹,Liu Jie¹^ORCID,Duan Xuan-Ming³,Zhao Zhen-Sheng¹

Affiliation:

1. Laboratory of Organic NanoPhotonics and CAS Key Laboratory of Bio-Inspired Materials and Interfacial Science, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, No. 29 Zhongguancun East Road, Beijing 100190, P. R. China

2. School of Future Technologies, University of Chinese Academy of Sciences, Yanqihu Campus, Huaibei Town, Huaibei Zhang, Huairou District, Beijing 101407, P. R. China

3. Chongqing Key Laboratory of Additive Manufacturing Technology and Systems, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, No. 266 Fangzheng Ave, Shuitu Hi-tech Industrial Park, Beibei District, Chongqing 400714, P. R. China

Funder

Cooperative R&D Project between FFG and CAS

the National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5030585

Reference37 articles.

1. A versatile diffractive maskless lithography for single-shot and serial microfabrication