Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels-Reference-Cited by-同舟云学术

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Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

Published:2016-06 Issue:6 Volume:6 Page:065312
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Majumder Apratim¹,Wan Xiaowen¹,Masid Farhana¹^ORCID,Pollock Benjamin J.²,Andrew Trisha L.²,Soppera Olivier³,Menon Rajesh¹

Affiliation:

1. Department of Electrical and Computer Engineering, University of Utah, Salt Lake City, Utah 84112, USA

2. Department of Chemistry, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA

3. Mulhouse Institute for Material Sciences, CNRS LRC 7228, BP2488, Mulhouse 68200, France

Funder

National Science Foundation (NSF)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4954178

Reference25 articles.

1. Ultrafast deep UV Lithography with excimer lasers

2. 1X deep-UV lithography with chemical amplification for 1-micron DRAM production

3. Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance

4. Zone-plate-array lithography: A low-cost complement or competitor to scanning-electron-beam lithography

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1. Super-resolution Reflection Microscopy via Absorbance Modulation;ACS Nanoscience Au;2023-06-14

2. Inverse-designed arbitrary-input and ultra-compact 1 × N power splitters based on high symmetric structure;Scientific Reports;2020-07-16

3. Superresolution optical nanopatterning at low light intensities using a quantum yield-matched photochrome;OSA Continuum;2019-05-06

4. 3D printing methods for micro- and nanostructures;Physics-Uspekhi;2019-01-31

5. Four-Directional Adaptive Residual Interpolation Technique for DoFP Polarimeters With Different Micro-Polarizer Patterns;IEEE Sensors Journal;2018-10-01

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