Low thermal budgetSiO2∕Si3N4∕SiO2 stacks for advanced SONOS memories

Author:

Saraf Meirav,Akhvlediani Roza,Edrei Rachel,Edelstein Ruth Shima,Roizin Yakov,Hoffman Alon

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference12 articles.

1. Ultrathin oxide‐nitride‐oxide films

2. Rapid thermal oxidation of thin nitride/oxide stacked layer

3. Symposium G1-207th ECS Meeting;Heiman A.,2005

4. Nitrogen diffusion and accumulation at the Si∕SiO[sub 2] interface in SiO[sub 2]∕Si[sub 3]N[sub 4]∕SiO[sub 2] structures for nonvolatile semiconductor memories

5. W. B. Nelson, Accelerated Testing: Statistical Models, Test Plans and Data Analysis (Wiley, New York, 2004), p. 624.

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