The effect of kinetics on intrinsic stress generation and evolution in sputter-deposited films at conditions of high atomic mobility-Reference-Cited by-同舟云学术

The effect of kinetics on intrinsic stress generation and evolution in sputter-deposited films at conditions of high atomic mobility

Published:2020-01-31 Issue:4 Volume:127 Page:045302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Jamnig A.¹²^ORCID,Pliatsikas N.²^ORCID,Sarakinos K.²^ORCID,Abadias G.¹

Affiliation:

1. Département Physique et Mécanique des Matériaux, Institut Pprime, UPR 3346 CNRS, Université de Poitiers, SP2MI, 11 Bvd M. et P. Curie, F86073 Poitiers Cedex 9, France

2. Nanoscale Engineering Division, Department of Physics, Chemistry, and Biology, Linköping University, SE 581 83 Linköping, Sweden

Funder

French government program “Investissements d'Avenir”

Åforsk foundation

Stiftelsen Olle Engkvist Byggmästare

Linköping University

Svenska Forskningsrådet Formas

Werner-Gren Foundation

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5130148

Reference65 articles.

1. Stress in Evaporated and Sputtered Thin Films – A Comparison

2. Volmer-Weber growth stages of polycrystalline metal films probed by in situ and real-time optical diagnostics

3. Review Article: Stress in thin films and coatings: Current status, challenges, and prospects

4. Tutorial: Understanding residual stress in polycrystalline thin films through real-time measurements and physical models

5. On surface stress and surface tension

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