Anisotropic interfacial strain in InP/InGaAs/InP quantum wells studied using degree of polarization of photoluminescence
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.365479
Reference27 articles.
1. Surface processes controlling the growth of GaxIn1−xAs and GaxIn1−xP alloy films by MBE
2. As capture and the growth of ultrathin InAs layers on InP
3. In situtime‐resolved monitoring of PH3induced exchange reactions on GaAs under metalorganic vapor phase epitaxy conditions
4. Anisotropic reflectance from semiconductor surfaces for in-situ monitoring in epitaxial growth systems
5. Origin of optical anisotropy in strained InxGa1−xAs/InP and InyAl1−yAs/InP heterostructures
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1. Experimental insights toward carrier localization in in-rich InGaAs/InP as candidate for SWIR detection: Microstructural analysis combined with optical investigation;Materials Science in Semiconductor Processing;2023-01
2. Layer-resolved release of epitaxial layers in III-V heterostructure via a buffer-free mechanical separation technique;Science Advances;2022-01-21
3. Mechanical stress in InP and GaAs ridges formed by reactive ion etching;Journal of Applied Physics;2020-12-14
4. Degree of polarization of luminescence from GaAs and InP as a function of strain: a theoretical investigation;Applied Optics;2020-06-16
5. Polarized cathodoluminescence for strain measurement;Review of Scientific Instruments;2019-04
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