Dynamics of Ar metastable and resonance states in pulsed capacitively coupled plasmas-Reference-Cited by-同舟云学术

Dynamics of Ar metastable and resonance states in pulsed capacitively coupled plasmas

Published:2021-09 Issue:9 Volume:28 Page:093507
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Kovalev A. S.¹^ORCID,Rakhimova T. V.¹^ORCID,Rakhimov A. T.¹²,Proshina O. V.¹,Vasilieva A. N.¹,Voloshin D. G.¹^ORCID

Affiliation:

1. Skobeltsyn Institute of Nuclear Physics (SINP MSU), Lomonosov Moscow State University, 1(2), Leninskie gory, GSP-1, Moscow 119991, Russian Federation

2. Faculty of Physics, Lomonosov Moscow State University, 1(2), Leninskie gory, GSP-1, Moscow 119991, Russian Federation

Funder

Russian Foundation for Basic Research

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0060660

Reference39 articles.

1. Pulsed high-density plasmas for advanced dry etching processes

2. Synchronous Pulse Plasma Operation upon Source and Bias Radio Frequencys for Inductively Coupled Plasma for Highly Reliable Gate Etching Technology

3. Inductively Coupled Pulsed Plasmas in the Presence of Synchronous Pulsed Substrate Bias for Robust, Reliable, and Fine Conductor Etching

4. Effect of simultaneous source and bias pulsing in inductively coupled plasma etching

5. Time-resolved measurements of the ion energy distribution function in a pulsed discharge using a double gating technique

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