A model for gate oxide wear out based on electron capture by localized states
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1445812
Reference18 articles.
1. Hole injection SiO/sub 2/ breakdown model for very low voltage lifetime extrapolation
2. Trap creation in silicon dioxide produced by hot electrons
3. Complementary model for intrinsic time-dependent dielectric breakdown in SiO2 dielectrics
4. First-principles calculations of defects in oxygen-deficient silica exposed to hydrogen
5. Ultra-thin oxide reliability for ULSI applications
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