A new setup for localized implantation and live-characterization of keV energy multiply charged ions at the nanoscale
Author:
Affiliation:
1. CIMAP (CEA, CNRS, ENSICAEN, UNICAEN, Normandie University), Boulevard Henri Becquerel, BP 5133, Caen 14070 Cedex 5, France
2. Orsay Physics (Tescan-Orsay Holding), 95 Avenue des Monts Auréliens, ZA Saint-Charles F-13710, Fuveau, France
Funder
Agence Nationale de la Recherche (ANR)
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4966675
Reference22 articles.
1. Focused Ion Beam nano-patterning from traditional applications to single ion implantation perspectives
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