Mask aligner for ultrahigh vacuum with capacitive distance control
Author:
Affiliation:
1. II. Institute of Physics B and JARA-FIT, RWTH Aachen University, 52074 Aachen, Germany
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5022462
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1. Field-Induced Nanometer- to Atomic-Scale Manipulation of Silicon Surfaces with the STM
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5. Invited Article: Autonomous assembly of atomically perfect nanostructures using a scanning tunneling microscope
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