Inductively coupled radio frequency plasma chemical vapor deposition using a ladder‐shaped antenna
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1146885
Reference8 articles.
1. Glow-discharge amorphous silicon: Growth process and structure
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5. Electromagnetic fields in a radio‐frequency induction plasma
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