Damage evolution and surface defect segregation in low-energy ion-implanted silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.118349
Reference8 articles.
1. Challenges for predictive process simulation in sub 0.1 μm silicon devices
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4. Refined universal potentials in atomic collisions
5. Atomic structure of collision cascades in ion-implanted silicon and channeling effects
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