Native defects in Al2O3 and their impact on III-V/Al2O3 metal-oxide-semiconductor-based devices
Author:
Funder
National Science Foundation
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3544310
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5. Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications
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