Property modifications of nanoporous pSiCOH dielectrics to enhance resistance to plasma-induced damage-Reference-Cited by-同舟云学术

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Property modifications of nanoporous pSiCOH dielectrics to enhance resistance to plasma-induced damage

Published:2008-11 Issue:9 Volume:104 Page:094109
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Ryan E. Todd,Gates Stephen M.,Grill Alfred,Molis Steven,Flaitz Philip,Arnold John,Sankarapandian Muthumanickam,Cohen Stephan A.,Ostrovski Yuri,Dimitrakopoulos Christos

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.3006438

Reference20 articles.

1. Intercalation of nitrogenous substances into HUO2PO4·4H2O

2. Low dielectric constant materials for microelectronics

3. Low Dielectric Constant Materials for ULSI Interconnects

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