Angular ion species distribution in droplet-based laser-produced plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4906277
Reference47 articles.
1. Laser-produced plasma light source for extreme-ultraviolet lithography applications
2. Improved reflectance and stability of Mo/Si multilayers
3. Three-dimensional extreme ultraviolet emission from a droplet-based laser-produced plasma
4. A hemispherical Langmuir probe array detector for angular resolved measurements on droplet-based laser-produced plasmas
5. Angular and energy distribution of Sn ion debris ejected from a laser-produced plasma source, for laser power densities in the range suitable for extreme ultraviolet lithography
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4. Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μ m range for their characterization as future extreme ultraviolet light sources;Physics of Plasmas;2023-03-01
5. Evidence of production of keV Sn+ ions in the H2 buffer gas surrounding an Sn-plasma EUV source;Plasma Sources Science and Technology;2023-03-01
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