Exposure instrumentation for the application of x‐ray lithography using synchrotron radiation

Author:

Oertel H.,Huber H.‐L.,Schmidt M.

Publisher

AIP Publishing

Subject

Instrumentation

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A beamline for photochemical processes at atmospheric pressure;Journal of Synchrotron Radiation;1998-05-01

2. Lithography for micro-electronics;Radiation Physics and Chemistry;1995-03

3. Status of the compact synchrotron radiation source cosy and first exposure experiments;Microelectronic Engineering;1991-03

4. Development of centrally controlled synchrotron radiation lithography beamline system;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1990-11

5. Application of positive and negative tone x-ray resist for 0.5μm CMOS device fabrication;Microelectronic Engineering;1990-04

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