Application of the simulator “XMAS” on specific problems in sub-half-micron lithography-Reference-Cited by-同舟云学术

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Application of the simulator “XMAS” on specific problems in sub-half-micron lithography

Published:1985-12 Issue:1-4 Volume:3 Page:387-394
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Oertel H.,Betz H.,Heuberger A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference1 articles.

1. Abstracts of the 29th International Symposium on Electron, Ion and Photon Beams;Betz,1985

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Three-dimensional resist process simulator PEACE (photo and electron beam lithography analyzing computer engineering system);IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;1991-06

2. X-ray lithography, where it is now, and where it is going;Journal of Electronic Materials;1990-07

3. Yield Improvement Through X-RAY Lithography;Defect and Fault Tolerance in VLSI Systems;1990

4. Exposure instrumentation for the application of x‐ray lithography using synchrotron radiation;Review of Scientific Instruments;1989-07

5. Computer-aided resist modelling with extended XMAS in x-ray lithography;Microelectronic Engineering;1989-05

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