Growth rate enhancement using ozone during rapid thermal oxidation of silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.112318
Reference19 articles.
1. Chlorine Incorporation in HCl Oxides
2. Silicon‐fluorine bonding and fluorine profiling in SiO2films grown by NF3‐enhanced oxidation
3. The Effects of Trace Amounts of Water on the Thermal Oxidation of Silicon in Oxygen
4. Low temperature photo-assisted oxidation of silicon
5. Enhancement in Thermal Oxidation of Silicon by Ozone
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