Author:
Burton Randolph H.,Hollien Cathy L.,Marchut Leslie,Abys Susan M.,Smolinsky Gerald,Gottscho Richard A.
Subject
General Physics and Astronomy
Cited by
23 articles.
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1. Compound Semiconductor Device Processing;Materials Science and Technology;2013-02-15
2. Mass Spectrometric Characterization of Plasma Etching Processes;Handbook of Advanced Plasma Processing Techniques;2000
3. Plasma Processing of III-V Materials;Handbook of Advanced Plasma Processing Techniques;2000
4. Compound Semiconductor Device Processing;Compound Semiconductor Devices;1998-10-15
5. Reactive ion etching for AlGalnP/GaInP laser structures;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1998-07