Electrical activation of implanted phosphorus ions in [0001]- and [11–20]-oriented 4H-SiC

Author:

Schmid F.,Laube M.,Pensl G.,Wagner G.,Maier M.

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 58 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Formation of ohmic contacts on heavily Al+-implanted p-type SiC without an alloying process;Japanese Journal of Applied Physics;2024-05-01

2. Study of Dopant Activation and Ionization for Phosphorus in 4H-SiC;Journal of Electronic Materials;2024-03-10

3. Selective Generation of V2 Silicon Vacancy Centers in 4H-Silicon Carbide;Nano Letters;2024-02-13

4. Low to Medium Dose Room and Elevated Temperature Implants in 4H-SiC Devices;2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-11-27

5. Excimer laser doping for the fabrication of 4H-SiC power devices;Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVIII;2023-03-17

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