Implantation damage in GaAs‐AlAs superlattices of different layer thickness
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.105493
Reference16 articles.
1. Doping of III–V compound semiconductors by ion implantation
2. Characteristics of Ion‐Implantation Damage and Annealing Phenomena in Semiconductors
3. Optically detected carrier confinement to one and zero dimension in GaAs quantum well wires and boxes
4. Dose‐dependent mixing of AlAs‐GaAs superlattices by Si ion implantation
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Damage behaviour of GaAs/AlAs multilayer structures;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-08
2. Ion-beam characterization in superlattices;Handbook of Thin Films;2002
3. Ion implantation in Al/sub x/Ga/sub 1-x/As: damage structures and amorphization mechanisms;IEEE Journal of Selected Topics in Quantum Electronics;1998
4. Investigation of Random and Channeling Ar+Implantation-Induced Damage in Al(In)GaAs/GaAs Quantum Wells;Japanese Journal of Applied Physics;1992-12-30
5. Optical study of Ar+implantation‐induced damage in GaAs/GaAlAs heterostructures;Journal of Applied Physics;1992-12-15
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