Oxidized metal Schottky contact with high-κ dielectric field plate for low-loss high-power vertical β-Ga2O3 Schottky diodes

Author:

Farzana Esmat1ORCID,Bhattacharyya Arkka2ORCID,Hendricks Nolan S.13,Itoh Takeki1ORCID,Krishnamoorthy Sriram1ORCID,Speck James S.1

Affiliation:

1. Materials Department, University of California, Santa Barbara, California 93106, USA

2. Department of Electrical and Computer Engineering, The University of Utah, Salt Lake City, Utah 84112, USA

3. Air Force Research Lab, Sensors Directorate, Wright Patterson AFB, Ohio 45433, USA

Abstract

We report on vertical β-Ga2O3 power diodes with oxidized-metal Schottky contact (PtOx) and high permittivity (high-κ) dielectric (ZrO2) field plate to improve reverse blocking at both Schottky contact surfaces and edges. The PtOx diodes showed excellent forward transport with near unity ideality factor and similar minimum specific on-resistance as Pt. Moreover, the PtOx contacts facilitated higher breakdown voltage and lower leakage current due to their higher Schottky barrier height (SBH) by more than 0.5 eV compared to that of Pt. Most importantly, the reduced off-state leakage of PtOx diodes enabled orders of magnitude less power dissipation than Pt ones for all duty cycles ≤0.5, indicating their great potential to realize low-loss and efficient, high-power β-Ga2O3 switches. The ZrO2 field-oxide further reduced edge leakage with a consistent increase in breakdown voltage. Device simulation demonstrated that the high permittivity of ZrO2 also led to the peak electric field occurring in β-Ga2O3 instead of the dielectric. These results indicate that the combined integration of oxidized-metal contacts to increase SBH and high-κ dielectric field plate to assist edge termination can be promising to enhance the performance of vertical β-Ga2O3 Schottky diodes.

Funder

Air Force Office of Scientific Research

Office of Naval Research

Publisher

AIP Publishing

Subject

General Engineering,General Materials Science

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3