Ga2O3/NiO junction barrier Schottky diodes with ultra-low barrier TiN contact

Author:

Gong Hehe12ORCID,Sun Na1,Hu Tiancheng1,Yu Xinxin1ORCID,Porter Matthew2ORCID,Yang Zineng2ORCID,Ren Fangfang1ORCID,Gu Shulin1ORCID,Zheng Youdou1,Zhang Rong1ORCID,Zhang Yuhao2ORCID,Ye Jiandong1ORCID

Affiliation:

1. School of Electronic Science and Engineering, Nanjing University 1 , Nanjing 210023, China

2. Center for Power Electronics Systems, The Bradley Department of Electrical and Computer Engineering, Virginia Polytechnic Institute and State University 2 , Blacksburg, Virginia 24061, USA

Abstract

Power Schottky barrier diodes (SBDs) face an inherent trade-off between forward conduction loss and reverse blocking capability. This limitation becomes more severe for ultra-wide bandgap (UWBG) SBDs due to the large junction field. A high Schottky barrier is usually required to suppress the reverse leakage current at the price of an increased forward voltage drop (VF). This work demonstrates a Ga2O3 junction barrier Schottky (JBS) diode that employs the embedded p-type NiO grids to move the peak electric field away from the Schottky junction, thereby allowing for the use of an ultra-low barrier TiN Schottky contact. This JBS diode concurrently realizes a low VF of 0.91 V (at forward current of 100 A/cm2) and a high breakdown voltage over 1 kV, with the VF being the lowest in all the reported vertical UWBG power diodes. Based on the device characteristics measured up to 200 °C, we further analyze the power loss of this JBS diode across a wide range of operational duty cycles and temperatures, which is found to outperform the TiN/Ga2O3 SBDs or NiO/Ga2O3 PN diodes. These findings underscore the potential of low-barrier UWBG JBS diodes for high-frequency, high-temperature power electronics applications.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Publisher

AIP Publishing

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