Nanopatterning by dual-ion-beam sputtering
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2816236
Reference19 articles.
1. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering
2. Is Ion Sputtering Always a “Negative Homoepitaxial Deposition”?
3. Characterising and controlling surface defects
4. Ripple Wave Vector Rotation in Anisotropic Crystal Sputtering
5. Spontaneous Nanoscale Corrugation of Ion-ErodedSiO2: The Role of Ion-Irradiation-Enhanced Viscous Flow
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1. Ion- and temperature-induced 3-dimensional nanoscale patterning in Ti1-xAlxN deposited by High Power Impulse Magnetron Sputtering;Thin Solid Films;2023-09
2. Scanning electron microscopic evaluation of broad ion beam milling effects to sedimentary organic matter: Sputter-induced artifacts or naturally occurring porosity?;International Journal of Coal Geology;2023-09
3. Towards ordered Si surface nanostructuring: role of an intermittent ion beam irradiation approach;Physica Scripta;2023-03-31
4. Abrupt pattern transitions in argon ion bombarded swinging Si substrates;Physical Review B;2022-12-20
5. Nanoscale pattern formation on solid surfaces bombarded by two broad ion beams in the regime in which sputtering is negligible;Physical Review E;2021-02-24
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