Properties of atomic layer deposited (Ta1−xNbx)2O5 solid solution films and Ta2O5–Nb2O5 nanolaminates
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.371576
Reference48 articles.
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3. Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature
4. Atomic Layer Epitaxy Growth of Tantalum Oxide Thin Films from Ta ( OC 2 H 5 ) 5 and H 2 O
5. A.C. polarisation in B-modification Nb2O5 single crystals
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