Electron Cyclotron Resonance Plasma-Enhanced Metalorganic Chemical Vapor Deposition of Tantalum Oxide Thin Films on Silicon near Room Temperature
Author:
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1151-2916.1995.tb08855.x/fullpdf
Reference20 articles.
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2. Quadruply self-aligned stacked high-capacitance RAM using Ta2O5high-density VLSI dynamic memory
3. Electrical properties of amorphous tantalum pentoxide thin films on silicon
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