A Study on the Development of Chemical Vapor Deposition Precursors. 4. Syntheses and Characterization of New N-Alkoxo-β-ketoiminate Complexes of Niobium and Tantalum-Reference-Cited by-同舟云学术

A Study on the Development of Chemical Vapor Deposition Precursors. 4. Syntheses and Characterization of New N-Alkoxo-β-ketoiminate Complexes of Niobium and Tantalum

Published:2002-03-20 Issue:4 Volume:14 Page:1548-1554
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Lim Sunkwon¹,Lee Joong Cheol¹,Sohn Do Sung¹,Lee Wan In¹,Lee Ik-Mo¹

Affiliation:

1. Department of Chemistry, Inha University, 253 Yonghyundong, Namku, Inchon 402-751, Korea

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm010590f

Reference54 articles.

1. Chemical Vapor Deposition of Tantalum Oxide from Tetraethoxo(β-diketonato)tantalum(V) Complexes

2. Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

3. Low-Pressure chemical vapour deposition of tantalum pentoxide films for ulsi devices using tantalum pentaethoxide as precursor

4. The Suitability of Ta2O5as a Solid State Ion-Sensitive Membrane

5. Enhancement of the dielectric constant of Ta2O5through substitution with TiO2

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