Tungsten‐carbon multilayers for x‐ray optics prepared by ArF excimer‐laser‐induced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346684
Reference6 articles.
1. Multilayers For X-Ray Optics
2. Fabrication and Evaluation of Mo-Si Multilayer Mirrors for Soft X-Rays
3. Tungsten–beryllium multilayer mirrors for soft x rays
4. Fabrication and testing of large area multilayer coated x-ray optics
5. Tungsten-Carbon X-ray Multilayered Mirror Prepared by Photo-Chemical Vapor Deposition
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1. Optical Devices for Extreme Ultraviolet;The Review of Laser Engineering;2007
2. Soft‐x‐ray multilayer mirrors with laterally varying film thicknesses fabricated using laser‐beam‐scanning chemical vapor deposition;Review of Scientific Instruments;1995-09
3. In-situ Auger electron spectroscopy of silicon thin films fabricated using ArF excimer laser-induced chemical vapor deposition and the oxidation process;Applied Surface Science;1994-05
4. Characterization of tungsten-silicon multilayer mirrors fabricated using an ArF excimer laser;Laser and Ion Beam Modification of Materials;1994
5. Reaction pathways for ArF excimer laser assisted tungsten chemical vapor deposition from a WF6–H2 gas mixture;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1993-11
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