Chemical sputtering of graphite by low temperature nitrogen plasmas at various substrate temperatures and ion flux densities
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4822166
Reference70 articles.
1. Structural properties and electronic structure of low-compressibility materials: β-Si3N4and hypothetical β-C3N4
2. A review of the preparation of carbon nitride films
3. Chemical sputtering of carbon by nitrogen ions
4. Interactions of nitrogen (N2+) and nitrosyl (NO+) ions with surfaces of graphite, diamond, teflon, and graphite monofluoride
5. Computer simulation of the ion beam deposition of binary thin films: Carbon nitride and boron carbide
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