Sputter depth profiling analysis of Ta2O5on Si without preferential sputtering by energetic oxygen ion beams
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.109146
Reference11 articles.
1. Beam-induced broadening effects in sputter depth profiling
2. Structural and compositional changes in ion-bombarded Ta2O5
3. Preferential sputtering of oxides: A comparison of model predictions with experimental data
4. Mass and energy dependence of the equilibrium surface composition of sputtered tantalum oxide
5. Characterization of a high depth-resolution tantalum pentoxide sputter profiling reference material
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