Deactivation kinetics of supersaturated boron:silicon alloys
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1385360
Reference6 articles.
1. Understanding and Controlling Transient Enhanced Dopant Diffusion in Silicon
2. Influence of nucleation on the kinetics of boron precipitation in silicon
3. The Annealing Time and Temperature Dependence of Electrical Dopant Activation in High‐Dose BF 2 Ion Implanted Silicon
4. Point defects and dopant diffusion in silicon
5. The Standard Thermodynamic Functions for the Formation of Electrons and Holes in Ge, Si, GaAs , and GaP
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