Point defects and dopant diffusion in silicon
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/RevModPhys.61.289/fulltext
Reference266 articles.
1. Etch Pits Observed in Dislocation-Free Silicon Crystals
2. A study of silicon interstitial kinetics using silicon membranes: Applications to 2D dopant diffusion
3. Enhanced Sb diffusion in Si under thermal Si3N4films during annealing in Ar
4. Film stress‐related vacancy supersaturation in silicon under low‐pressure chemical vapor deposited silicon nitride films
5. A Staining Technique for the Study of Two‐Dimensional Dopant Diffusion in Silicon
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