The range of light ions in polymeric resists
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.334189
Reference17 articles.
1. Ion beam exposure characteristics of resists: Experimental results
2. The Influence of the Amorphous Phase on Ion Distributions and Annealing Behavior of Group III and Group V Ions Implanted into Silicon
3. Concentration profiles of boron implantations in amorphous and polycrystalline silicon
4. Range parameters of heavy ions in amorphous targets at LSS-energies of 0.0006⩽ ϵ ⩽ 0.3
5. Profiling hydrogen in materials using ion beams
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1. Mechanisms of Particle—Polymer Interaction;Fundamentals of Ion-Irradiated Polymers;2004
2. Composition and temperature-induced effects on the phonon spectra of narrow-band-gapHg1−xCdxTe;Physical Review B;1995-12-15
3. Resist planarization over topography using ion implantation;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11
4. Ranges in Si and lighter mono and multi-element targets;Materials Science and Engineering: R: Reports;1995-07
5. Modelling of physical processes in ion lithography;Thin Solid Films;1992-07
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