Ion beam exposure characteristics of resists: Experimental results
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.331261
Reference11 articles.
1. Electron Resists for Microcircuit and Mask Production
2. Negative Electron Resists for Direct Device Lithography: I . Initial Material Survey
3. Electron irradiation of poly(olefin sulfones). Application to electron beam resists
4. EBES: A practical electron lithographic system
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