Time dependent plasma properties during microarcing in radio frequency plasmas
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2806186
Reference10 articles.
1. Microarcing instability in RF PECVD plasma system
2. Micro-arcing in radio frequency plasmas
3. Enhancement of microarcing at a grounded chamber wall by nonvanishing ion sheath in a radio-frequency capacitive discharged plasma
4. Analytic analysis on asymmetrical micro arcing in high plasma potential RF plasma systems
5. 2004 IEEE Conference on Integrated Circuit Design and Technology;Parker J.,2004
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2. Observation of prior light emission before arcing development in a low-temperature plasma with multiple snapshot analysis;Scientific Reports;2022-12-05
3. Wafer Movement and Micro-Arc Discharges: Detection;Encyclopedia of Plasma Technology;2016-12-12
4. Micro-arc ignition on the oily surface of capacitively-coupled plasma;Current Applied Physics;2015-03
5. Statistical Prediction of Micro-Arcing in Radio-Frequency Plasmas for Manufacture of Semiconductor Device;Japanese Journal of Applied Physics;2013-06-01
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