Statistical Prediction of Micro-Arcing in Radio-Frequency Plasmas for Manufacture of Semiconductor Device
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference30 articles.
1. Profile simulation of high aspect ratio contact etch
2. Plasma‐charging damage: A physical model
3. Resist-related damage on ultrathin gate oxide during plasma ashing
4. Modeling of charging damage during interlevel oxide deposition in high-density plasmas
5. Depassivation of latent plasma damage in nMOSFETs
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