Detection of microarc discharge using a high-speed load impedance monitoring system
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/7/i=9/a=096102/pdf
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1. Wafer level microarcing model in 90nm chemical-vapor deposition low-k via etch on 300mm silicon-on-insulator substrate
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4. Studies on Magnetron Sputtering Assisted by Inductively Coupled RF Plasma for Enhanced Metal Ionization
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3. Injection-Locked Magnetron Using a Cross-Domain Analyzer;IEEE Microwave and Wireless Components Letters;2016-11
4. Monitoring of Condition of Deposited Film Causing Particles in Plasma Etching by Using Practical Load Impedance Monitoring Method;Journal of the Vacuum Society of Japan;2016
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