Integration of atomic layer deposited high-k dielectrics on GaSb via hydrogen plasma exposure
Author:
Affiliation:
1. Electronics Science and Technology Division, Naval Research Laboratory, Washington, DC 20375, USA
Funder
Office of Naval Research (ONR)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://scitation.aip.org/deliver/fulltext/aip/journal/adva/4/12/1.4905452.pdf?itemId=/content/aip/journal/adva/4/12/10.1063/1.4905452&mimeType=pdf&containerItemId=content/aip/journal/adva
Reference34 articles.
1. Emerging silicon and non-silicon nanoelectronic devices: opportunities and challenges for future high-performance and low-power computational applications (invited paper)
2. Carrier Transport in High-Mobility III–V Quantum-Well Transistors and Performance Impact for High-Speed Low-Power Logic Applications
3. Benchmarking Nanotechnology for High-Performance and Low-Power Logic Transistor Applications
4. Considerations for Ultimate CMOS Scaling
5. Enhanced hole mobility and density in GaSb quantum wells
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1. Demonstration of genuine surface inversion for the p/n-In0.3Ga0.7Sb-Al2O3 MOS system with in situ H2 plasma cleaning;Applied Physics Letters;2019-12-02
2. Interfacial characteristics of Y2O3/GaSb(001) grown by molecular beam epitaxy and atomic layer deposition;Journal of Crystal Growth;2017-11
3. Effects of GaSb surface preparation on the characteristics of HfO2/Al2O3/GaSb metal-oxide-semiconductor capacitors prepared by atomic layer deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-01
4. Interface Characterization of HfO2/GaSb MOS Capacitors With Ultrathin Equivalent Oxide Thickness by Using Hydrogen Plasma Treatment;IEEE Transactions on Electron Devices;2016-09
5. Electronic properties of atomic-layer-deposited high-k dielectrics on GaSb(001) with hydrogen plasma pretreatment;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-07
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