Interfacial atomic structures, energetics and band offsets of Ge:ZrO2 interfaces

Author:

Tse Koon-Yiu,Robertson John

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Oxygen vacancy related hole fast trapping in high mobility cubic-Ge/ZrO2 interface;Journal of Physics D: Applied Physics;2023-02-16

2. Ultrathin EOT (0.67 nm) High-k Dielectric on Ge MOSFET Using Y Doped ZrO2 With Record-Low Leakage Current;IEEE Electron Device Letters;2019-04

3. Density-functional theory molecular dynamics simulations of a-HfO2/Ge(100)(2 × 1) and a-ZrO2/Ge(100)(2 × 1) interface passivation;The Journal of Chemical Physics;2016-02-28

4. First principles study of structural and electronic properties of cubic phase of ZrO2 and HfO2;Physica B: Condensed Matter;2014-02

5. Passivation of interfacial defects at III-V oxide interfaces;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-07

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